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Note: the notice below is the original posting for the workshop. Due to the fact that Mike Kersker and Masa Kawasaki were unable to travel to Michigan that week, two other lecturers were added to the schedule.

Robert Klie from Brookhaven National Laboratory and Alan Nicholls from the University of Illinois at Chicago came to Michigan and presented lectures and Mike Kersker presented his lecture via the internet.

The presentation files are archived here. EMAL Practical Workshop Number 1 in an Occasional Series

EMAL and JEOL USA Inc. are pleased to present:

Optimal Use of the JEOL 2010F for Advanced Transmission Electron Microscopy

Dr. Mike Kersker
Vice President
&
Dr. Masahiro Kawasaki
Applications Specialist

JEOL USA Incorporated, 11 Dearborn Road
Peabody, MA 01960

Exact times to be determined
Probably morning lectures and afternoon laboratories
Tuesday, Wednesday and Thursday, June 27th, 28th and 29th, 2006

Lectures in Room 2246, Space Research Building, University of Michigan, Ann Arbor, MI 48109-2143
(Same building as the North Campus EMAL, for directions click here)
Laboratory sessions in 431 EMAL

Workshop Outline: 2010F FasTEM: Advanced Course

Day 1: TEM Lecture before Lunch/Hands-on Lab following

1. General Electron Optics and Principles;

1. Electron Lenses: Objective, Condenser, Projector

2. Optical Elements – Front Focal Plane/ Back focal plane/etc.

3. Ray diagrams

2. Condenser/Objective Optics: Riecke/Ruska

a. Use of Condenser Minilenses

b. Finding the correct alignment with a large prefield

c. Alpha selector

d. Microdiffraction

e. Fine probe selection

f. Eucentricity

1. Optical significance

2. Mechanical significance

3. Free Lens Control

a. finding crossovers – Differential pumping apertures, fixed C1 apertures, etc.

b. increasing current – using C1 independently

c. GIF Mode – How to set up the instrument when there is no function for GIF

d. Camera lengths – changes without changing the projector crossover point – for GIF

Sample: Si/SiO/SrTiO3

Day 2: TEM/STEM

1. Imaging and Diffraction: Lecture before lunch, demo before lunch

a. Koehler

1) Skewed thoughts on Parallelism – measuring and understanding beam convergence

2) High Contrast Aperture

3) Measurement of Convergence

4) Positional accuracy of diffraction and shadow image.

5) Camera length variation with focused patterns

2. STEM: Lecture after lunch, Hands-on lab after lunch

a. STEM conditions/camera lengths

b. Gun Conditions: finding the optimum values

c. Ultra high resolution

1. A2 – change value

2. Objective lens angle – underfocus to overexcite

Condenser 3 lens

Sample: Si/SiO/SrTiO3

Day 3: FasTEM/STEM: lecture before lunch, Hands-on lab before lunch

1. Remote Control

2. Foucault Imaging

3. EELS

a. Effect of gun

b. Collection angle

c. STEM Diffraction/TEM Diffraction

d. PL Crossover

Sample: Si/SiO/SrTiO3

EDS

a. Aperture selection

b. Analytical measurements

1) Hole Counts

2) P/B

3) Film Count

4) NiK and NiL ratio: detector test and specimen stage position

Sample: NiOx on Carbon on Mo grid

Conclusion: