Surface oxide formed during oxidation of experimental W-rich Ni-base superalloys in simulated impure-He environment. SE image recorded on Philips XL30 FEG SEM at 20kVImage by Raghav Adharapurapu, Prof. Pollock's Research Group
Silicon <111> convergent beam electron diffraction pattern, bright field disc showing 3m symmetry.Pattern by John Mansfield
SEM image of porous silicon.Image by EMAL Staff
An XEDS map of a semiconductor chip, green is the silicon K alpha line, yellow is the gols M alpha line and red the carbon K line.Image by John Mansfield
Medium magnification image of 500nm film of NiTi sputtered on carbon nanotube forest. SE image on Nova Nanolab taken at 10 kV.Image taken by Anne Juggernauth
Scanning electron microscope image of a gold coated AFM tip. Recorded in the FEI Nova NanoLab.Image by Aaron Tan.
*Note there are TWO basements in the building, the North Campus EMAL is in the west basement and the rooms of the laboratory are shaded in yellow.
Map of North Campus EMAL (Offices and Instruments
Map of Whole Building
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