HREM image of grains of silicon nitride
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
An XEDS map of a semiconductor chip, green is the silicon K alpha line, yellow is the gols M alpha line and red the carbon K line.
Image by John Mansfield
Low magnification SEM image of a carbon nanotube mat modified by shots from a femtosecond laser. Accelerating voltage 2kV.
Image by John Mansfield
Scanning electron microscope image, recorded in the Hitachi S3200N SEM, of a small gold particle formed after heat treatment of a series of thin films of LaSrTiO3/BaTiO3 grown on top of a SrTiO3 substrate via pulse-laser deposition.
A scanning transmission electron micrograph recorded in a Dualbeam FIB of semi-coherent copper aluminum precipitates in an aluminum alloy.
Image by FEI
Convergent beam electron diffraction pattern of M23X6, a metal carbo-nitro-boride common in steels.
Pattern by John Mansfield
Two grains of silicon nitride, one at an <0001> axis and the other at a nearby two beam condition. Interface is amorphous.
Image by Pan Group
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Laboratory Manager (Central Campus) |
Address:
Central Campus Electron Microbeam Analysis Laboratory
Geological Sciences, R.B. Mitchell Laboratory
1006 C.C. Little Building
University of Michigan
Ann Arbor, MI 48109-2143
E-mail: chender@umich.edu
Phone: (734) 936-1555
Contact me for:
SEM, Microprobe and specimen preparation equipment:
Training and problems in Central Campus EMAL.
Schedule
My normal schedule is 9:00 a.m. to 5:30 p.m. Monday through Friday.
How to get training
E-mail me or call me to set up a training session