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HAADF STEM Image of Copper Aluminum Precipitates

A high angle annular dark field scanning transmission electron micrograph recorded in a Dualbeam FIB of semi-coherent copper aluminum precipitates in an aluminum alloy.

Image by FEI

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HAADF STEM Image of Copper Aluminum Precipitates

A high angle annular dark field scanning transmission electron micrograph recorded in a Dualbeam FIB of semi-coherent copper aluminum precipitates in an aluminum alloy.

Image by FEI

Ying Qi

John Mansfield

Electronics Engineer (North Campus)

Address:
Electron Microbeam Analysis Laboratory (North Campus)
University of Michigan
Building 22, Room G011B
2800 Plymouth Road
Ann Arbor, MI 48109-2800

E-mail: yqi@umich.edu
Phone:(734) 764-5619
Fax: (734) 764-2931

Contact me for:
Nanoindenter training.
General electronics problems in EMAL.

Schedule
My normal schedule 8:30 AM - 12:00 PM on Tuesday, Wednesday and Friday mornings.

How to get training
Use E-mail me or call me to arrange introductions to the EMAL indenter systems (Triboscope and NanoInstruments) or for general electronics problems. My work time is spent split between three buildings, HH Dow, NC EMAL (Space Research Building) and the XMAL facilities in Gerstacker, therefore email is probably the best way to contact me.