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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

Microscopy Teaching & Learning Resources

The following tutorials, lectures, short courses, web course, etc. are offered by personnel in the field of microscopy from across the globe.   Some are presented by people associated with the University of Michigan Electron Microbeam Analysis Laboratory, often as part of full fledged courses such as MSE-562.