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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

Enraf Nonius CAD4 Single Crystal X-Ray Diffractometer

Location: 2501B C. C. Little Building
Contact: Anja Schleicher
Acknowledgments: Funding for this instrument came from a variety of sources, publication acknowledgements should refer to the support of the University of Michigan Electron Microbeam Analysis Laboratory

Enraf Nonius CAD4 Single Crystal X-Ray Diffractometer: The CAD4 is a single crystal X-ray diffractometer which has been modified for XTG (X-ray Texture Goniometry) to collect fabric measurements on phyllosilicate-bearing rock samples.

Features

CAD4 XRD The Enraf Nonius CAD4 Single Crystal X-Ray Diffractometer