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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

The Hitachi S3200N Scanning Electron Microscope

Location: 2501B C. C. Little Building
Contact: Gordon Moore

Scanning Electron Microscopy: The Hitachi S3200N Scanning Electron Microscope is one of a new series of Variable Pressure Scanning Electron Microscopes (VPSEM). The VPSEM is a conventional high resolution thermionic SEM which allows the operator to control the specimen chamber vacuum level and environment. A specimen maybe inserted directly into the VPSEM and observed in it's natural state.

Applications

Accelerating Voltages

Filament

Vacuum

Detectors

Magnification

SEM Resolution

Hitachi S3200 SEM Denette Murphy, a graduate student in Biology, operating the Hitachi S3200N SEM.