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Dislocations in Si-Ge Thin Film

TEM image of dislocations in a silicon and silicon-gremanium thin film system.

Image by John Mansfield

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Dislocations in Si-Ge Thin Film

TEM image of dislocations in a silicon and silicon-gremanium thin film system.

Image by John Mansfield

Nanoinstruments NanoIndenter II (1994)

Location: 421 Space Research Building
Contact: Ying Qi
Instructions: See Ying Qi
Acknowledgments: Publications resulting from work on this instrument should acknowledge the support of NSF grant #DMR-9408306

When it was purchased in 1994, this low load indentation instrument provided for spatially resolved, low load indentation on a wide variety of materials, and enaabled significant enhancement in the understanding and improving the mechanical and physical properties of advanced materials and materials systems. However, it is now nearly 20 years old and suffers frequent parts failure. Parts are becoming increasingly difficult to obtain and the DOS-based computer system on which it relies is in no longer relaible. A proposal to NSF is in the works to fund a replacement.