Play
Close
UMSeal.jpg

Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

Caption Arrow

Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

The EMAL JEOL 2010F Analytical Electron MicroscopeF

Location: 415 Space Research Building
Phone: (734) 936-0630

View of the JEOL 2011F in room 431 of the North Campus EMAL. The image is brought to you from a Sony EVI-D30 Video Camera via an Axis 240Q Video Server.

Pan-Tilt control of this video camera is available to users who have a password.