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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

Philips XL 30 ESEM Electron Microscope in the North Campus EMAL

Location: 415 Space Research Building
Phone: (734) 936-3350

View of the Philips/FEI XL30 ESEM in room 422 of the North Campus EMAL. The image is brought to you via an Axis 206 Network Camera.