North Campus Instruments - FEI Nova Nanolab Dualbeam Focussed Ion Beam Workstation and Scanning Electron Microscope

Applications

FIB, SEM, XEDS

Accelerating Voltage

Electrons: 0.2 to 30 kV Ions: Upto 30kV

Electron Filament

Schottky Field Emitter

Vacuum

Gun Chamber: torr Specimen Chamber:

Detectors

Electron Imaging - Everhart-Thornley Detector (SED) Electron Imaging - Through-the-lens Detector X-ray - EDAX UTW detector

SEM Resolution

3.5nm @ 30kV at high vacuum 3.5nm @30kV in ESEM mode <15nm @ 3kV in low vacuum mode.

Ion Resolution

7nm @ 30kV @ 1pA

XEDS System

EDAX XEDS system integrated into the Support PC.

Gas Injectors

Platinum XeF2

Micromanipulator (plucker)

Kleindiek Nanotechnik MM3A

Included Software

AutoFIB, AutoTEM, Slice and View and XtDocu.

Dr. Sha Zhu, a Post-Doctoral Research Fellow in Nuclear Engineering and Radiological Sciences, sectionning a sample with the Nova NanoLab Dualbeam FIB. Specimen Preparation Papers of Interest to Users H-bar technique - "Microscopic studies of semiconductor lasers utilizing a combination of transmission electron microscopy, electroluminescence imaging, and focused ion beam sputtering." R. Hull, D. Bahnck, F. A. Stevie, L. A. Koszi, and S. N. G. Chu - App. Phys. Lett., Vol. 62, No. 26, 28 June 1993. H-bar technique - "In Situ Studies of the Interaction of Dislocations withPoint Defects during Annealing of Ion Implanted Si/SiGe/Si (001) Heterostructures." Eric A. Stach, Robert Hull, John C. Bean, Kevin S. Jones and Ahmed Nejim - Microsc. Microanal. 4, 294 - 307, 1998.