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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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Michigan Seal Milled into InAs using a Focused Ion Beam

SEM image of a University of Michigan seal milled into an InAs wafer using a low current focused ion beam (FIB) and low ion dose. The outer diameter of the seal is ~ 9.7 µm.
Image by Kevin Grossklaus, Millunchick Research Group.

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As part of our commitment to maintain the privacy of our Web users, The University of Michigan has a statement of Student Rights and Records (http://www.ro.umich.edu/ferpa/) and Guidelines for Implementing the Proper User Policy of the University of Michigan: Responsible Use of Technology Resources (http://www.itcs.umich.edu/itpolicies/ ). The statement and guidelines have two purposes:

The University of Michigan also complies with the Family Educational Rights and Privacy Act (FERPA), which prohibits the release of education records without student permission. Although FERPA regulations apply only to U-M students, EMAL and the University of Michigan are equally committed to protecting the privacy of all of our users.